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Giant negative magnetoresistance of semi-insulating amorphous indium oxide films in strong magnetic fields

Gantmakher, V F; Golubkov, M V; Lok, J G S; Geim, A K

Zhurnal Eksperimentalnoi I Teoreticheskoi Fiziki. 1996;109(5):1765-1778.

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Abstract

We have studied magnetoresistance in thin films of amorphous indium oxide with various degrees of oxidation, i. e., with various densities of states in the vicinity of the Fermi level. A large negative magnetoresistance is observed when the films are in the insulating state. The negative field derivative partial derivative R/partial derivative H of the resistance persists up to 20 T, the highest magnetic field in our experiment. The magnetoresistance is described in terms of a field-dependent gap at the Fermi level. Such a gap can arise due either to tunneling in a system of fluctuation-induced superconducting clusters or to the Cooper interaction between electrons localized in shallow minima of the random potential. In the latter case, if the depth of the minima is smaller than the Debye energy, the electrons are virtually delocalized by short-wavelength phonons.

Bibliographic metadata

Type of resource:
Content type:
Published date:
Language:
english
Alternative journal title:
Zh Eksp Teor Fiz+
ISSN:
Volume:
109
Issue:
5
Start page:
1765
End page:
1778
Total:
14
Pagination:
1765-1778
ISI Accession Number:
ISI:A1996UV69800019
Related website(s):
  • Related website <Go to ISI>://A1996UV69800019
General notes:
  • Uv698 Times Cited:12 Cited References Count:32
Access state:
Active

Institutional metadata

University researcher(s):

Record metadata

Manchester eScholar ID:
uk-ac-man-scw:192616
Created by:
Hawthornthwaite, Sabina
Created:
19th April, 2013, 15:04:37
Last modified by:
Hawthornthwaite, Sabina
Last modified:
19th April, 2013, 15:04:37

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