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- DOI: 10.1021/nl1018782
- PMID: 20945880
- UKPMCID: 20945880
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Parallel Scanning Near-Field Photolithography: The Snomipede.
Haq, Ehtsham Ul; Liu, Zhuming; Zhang, Yuan; Ahmad, Shahrul A Alang; Wong, Lu-Shin; Armes, Steven P; Hobbs, Jamie K; Leggett, Graham J; Micklefield, Jason; Roberts, Clive J; Weaver, John M R
Nano Letters. 2010;10:4375-4380.
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Full-text held externally
- DOI: 10.1021/nl1018782
- PMID: 20945880
- UKPMCID: 20945880
Abstract
The "Millipede", developed by Binnig and co-workers ( Bining , G. K. ; et al. IBM J. Res. Devel. 2000 , 44 , 323. ), elegantly solves the problem of the serial nature of scanning probe lithography processes, by deploying massive parallelism. Here we fuse the "Millipede" concept with scanning near-field photolithography to yield a "Snomipede" that is capable of executing parallel chemical transformations at high resolution over macroscopic areas. Our prototype has sixteen probes that are separately controllable using a methodology that is, in principle, scalable to much larger arrays. Light beams generated by a spatial modulator or a zone plate array are coupled to arrays of cantilever probes with hollow, pyramidal tips. We demonstrate selective photodeprotection of nitrophenylpropyloxycarbonyl-protected aminosiloxane monolayers on silicon dioxide and subsequent growth of nanostructured polymer brushes by atom-transfer radical polymerization, and the fabrication of 70 nm structures in photoresist by a Snomipede probe array immersed under water. Such approaches offer a powerful means of integrating the top-down and bottom-up fabrication paradigms, facilitating the reactive processing of materials at nanometer resolution over macroscopic areas.