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Wettability analysis of laser deposited Ti:Sapphire

Schmidt, Marc; Li, Lin

Applied Surface Science. 2003;208:651-657.

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Abstract

The wetting properties for materials in the optical and microelectronic sector are of prime importance for a variety of process and preparation steps. Etching, and wafer direct bonding are only two of the relevant areas of application. Laser deposited Ti:Sapphire holds strong relevance for potential application on micro-electronic and micro-optical integration. The analysis of their wettability performance is therefore of relevance for potential engineering and manufacturing processes. In this paper, we evaluate the wettability of the deposited film systems, dependent on deposition parameters, to determine the polar and dispersive intermolecular forces of the material by using a control system of liquids. An interpretation of the results, in view of the deposition parameters and potential manufacturing applications is attempted.

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Publishers website:
http://www.sciencedirect.com/science/journal/01694332
Volume:
208
Start page:
651
End page:
657
Total:
7
Pagination:
651-657
Digital Object Identifier:
10.1016/S0169-4332(02)01417-4
Related website(s):
  • Related website http://dx.doi.org/10.1016/S0169-4332(02)01417-4
Access state:
Active

Record metadata

Manchester eScholar ID:
uk-ac-man-scw:1e1090
Created:
17th September, 2009, 22:17:41
Last modified:
18th August, 2015, 13:30:09

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